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White Papers > Materials and Gases

Emerging materials in semiconductors

Mark Thirsk & Mike Corbett, Linx Consulting LLC, Massachusetts, USA Read more >>

High-k/metal gate materials and processes for 32nm technology

01 December 2007 | Edition 36, Materials and Gases
C. S. Park, G. Bersuker, S. C. Song, P. Kirsch & B. H. Lee, SEMATECH, Austin, Texas; R. Jammy, IBM assignee to SEMATECH
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Memory material development at SEMATECH

01 September 2007 | Edition 35, Materials and Gases
Paul Kirsch, S.C.Song, & Prashant Majhi, SEMATECH & Raj Jammy, IBM assignee to SEMATECH Read more >>

Effect of pump type on the health of various CMP slurries

By Mark R. Litchy, Donald C. Grant, CT Associates, Inc., USA and Reto Schoeb, Levitronix GmbH, Switzerland Read more >>

Challenges and approaches for introducing TMAl into R&D fab processing

By Don Baskin & Paul Scheibmeir, ATDF Read more >>

CMP chemistry and materials challenges for ultra low-k integration

01 December 2006 | Edition 32, Materials and Gases
Robert L. Rhoades, Entrepix, Inc., Arizona, USA & Gautam Banerjee, Air Products and Chemicals, Inc., Arizona, USA
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Application of electrochemical regenerated ion exchange to wastewater recycle, mixed acid wastes and

C.P. Jones, A.M. Pierce, B.R. Roberts, BOC Edwards, USA Read more >>

Advances in dual damascene copper deposition technologies

Robert Preisser, Atotech Deutschland, Berlin, Germany Read more >>

in-line metrology and control of gas mixtures in semiconductor processing applications

01 December 2005 | Edition 28, Materials and Gases
Josep Arnó (ATMI Inc.) and Craig Printy (National Semiconductor) Read more >>

Cost-reduction opportunities through tote supply of chemicals and slurry

01 December 2005 | Edition 28, Materials and Gases
J. Connelly and W. Curcie, Infineon Technologies Read more >>