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White Papers > Lithography

0.15µm Lithography with KrF

01 December 1999 | Edition 10, Lithography
WILL CONLEY, MIRCEA DUSA, ROBERT SOCHA, National Semiconductor Corp., Santa Clara, CA, USA
NIGEL FARRER, Hewlett-Packard Company, ULSI Research Labs, Palo Alto, CA, USA.
HAREEN GANGALA, Cypress Semiconductor, San Jose, CA, USA
CARL BABCOCK, AMD Corporation, Sunnyvale, CA, USA
HUA-YU LIU, Numerical Technologies Inc., Santa Clara, CA, USA Read more >>

The Development of Step and Scan

01 March 1999 | Edition 09, Lithography
DR HARRY SEWELL, SVG Lithography Systems, Inc., Wilton, CT, USA Read more >>

Sub-Wavelength Lithography Using OPC

01 March 1999 | Edition 09, Lithography
FRANK M. SCHELLENBERG, Mentor Graphics, Inc., Wilsonville, OR, USA Read more >>

Simulation for DUV-Lithography

01 March 1999 | Edition 09, Lithography
WOLFGANG HENKE, Fraunhofer Institut Siliziumtechnologie, Itsehoe, Germany Read more >>

Metrology Issues in the Age of Next Generation Lithography

01 March 1999 | Edition 09, Lithography
S. A. RIZVI, Photronics Inc., Milpitas, CA, USA Read more >>

193 nm Microlithography and DUV Light Source Design

01 March 1999 | Edition 09, Lithography
BERND NIKOLAUS, OLIVIER SEMPREZ, GERRY BLUMENSTOCK, PALASH DAS, Cymer, Inc., San Diego, CA, USA Read more >>