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White Papers > Lithography

ODP for post-lithography metrology of 3D structures

01 March 2005 | Edition 25, Lithography
Kelly Barry & Sanjay Yedur, Timbre Technologies, Inc., Santa Clara, CA, USA# Read more >>

Impact of photoinduced defects to ARF lithography

01 March 2005 | Edition 25, Lithography
Florence Eschbach, Intel Corporation, Intel Mask Operations, Santa Clara, CA, USA, and Alex Gallegos, Intel Corporation, Fab21, Rio Rancho, NM, USA Read more >>

Enhanced nanoimprint process for advanced lithography applications

01 March 2005 | Edition 25, Lithography
S.V. Sreenivasan, Ian McMackin, Frank Xu, David Wang & Nick Stacey, Molecular Imprints, Inc., Austin, Texas, USA and Doug Resnick, Motorola Research Laboratories, Tempe, AZ, USA Read more >>

Advanced measurements for photoresist fundamentals

01 December 2004 | Edition 24, Lithography
Vivek M. Prabhu & Eric K. Lin, National Institute of Standards and Technology, Gaithersburg, USA Read more >>

RETs: understanding the cost of complexity

01 August 2004 | Edition 23, Lithography
Mark E. Mason, Texas Instruments Incorporated, Dallas, Texas, USA Read more >>

Optical lithography: the long goodbye

01 June 2004 | Edition 22, Lithography
Mark Osborne, Editor-in-Chief, Semiconductor Fabtech
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Metrology challenges for the photolithography masks

01 June 2004 | Edition 22, Lithography
M. Dilger, F. Gans & J.H. Peters, Advanced Mask Technology Center GmbH & Co. KG, Dresden, Germany Read more >>

Immersion fluids for lithography: refractive index measurement using prism minimum deviation techniq

01 June 2004 | Edition 22, Lithography
Ron A. Synowicki, Greg K. Pribil, Gerry Cooney, Craig M. Herzinger & Steven E. Green, J.A. Woollam Co., Inc. 645 M Street, Suite 102, Lincoln, NE, USA, Roger H. French, Min K. Yang, M.F. Lemon, DuPont Co Central Research, E356-384, Wilmington, DE, USA, John H. Burnett & Simon Kaplan, National Institute of Standards and Technology, Atomic Physics Division, 100 Bureau Drive, Gaithersburg, MD, USA Read more >>

The more and less of effective overlay control

01 March 2004 | Edition 21, Lithography
Ming Yeon Hung, Taiwan Semiconductor Manufacturing Company Xuemei Chen, KLA-Tencor Corporation George Shanthikumar, University of California at Berkeley, CA, USA
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Photoresist strip capabilities at sub-90-nm IC manufacturing

01 March 2004 | Edition 21, Lithography
Janardhan Devrajan & Neil Fernandes, Novellus Systems, Inc., San Jose, CA, USA Read more >>