White Papers

White Papers > Lithography

Sources of overlay error in double patterning integration schemes

01 March 2008 | Edition 37, Lithography

David Laidler, Philippe Leray, Koen D’Havé & Shaunee Cheng, IMEC, Leuven, Belgium Read more >>

193nm reticle haze: the dirty little secret and its ultimate solution?

01 March 2008 | Edition 37, Lithography

Oleg Kishkovich, Anatoly Grayfer & Frank V. Belanger, Entegris, Inc., Franklin, MA, USA Read more >>

Prospects of incorporating directed self-assembly into semiconductor manufacturing

01 December 2007 | Edition 36, Lithography

R. Singh, T. Boland, R. Mulye, G. Gaur, J.Steelman, D. Arya, N. Srinidhi and P.Deshmukh, Holcombe Department of Electrical and Computer Engineering and Center for Silicon Nanoelectronics, Clemson University, South Carolina, USA Read more >>

Developing micro ADI methodology for new litho process monitoring strategies

01 December 2007 | Edition 36, Lithography

KLA-Tencor and Qimonda Read more >>

Defect metrology in water immersion ArF lithography

01 September 2007 | Edition 35, Lithography

Uzodinma Okoroanyanwu, AMD, USA; Remo Kirsch & Marcel Grundkowski, AMD Fab 36, Germany; Rene Wirtz & Wolfram Grundke, AMD Saxony LLC, Germany Read more >>