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Dean W. Freeman, Gartner Dataquest, San Jose, California Read more >>

By Reiner Missale, Qimonda AG, Germany Read more >>

By Gino Crispieri, e-Manufacturing Project PMP, ISMI, Texas, USA Read more >>

Robert Bixby, ILOG Inc., & Rich Burda & David Miller, IBM, U.S.A.
 
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Discussion panel contributors include: Harvey Wohlwend, Manager International SEMATECH Manufacturing
Initiative, Mark Pendleton, Principal Software Architect, Asyst Technologies & Michael Arnold, Managing
Director and Program Manager fab services, PEER Group. Read more >>

Michael Corbett and Mark Thirsk, Linx Consulting LLC Read more >>

Walt Trybula, The Trybula Foundation Inc., & Brian Grenon, Grenon Consulting, Christian K. Kalus, President and Chief Technology Officer, SIGMA-C, Munich, Germany, Nigel Farrar, Vice President Lithography Applications, Cymer Inc., San Diego, CA, USA, Frank D. Masciocchi, Senior Vice President of Sales and
Marketing, Litel Instruments, San Diego, CA, USA, Martin McCullum, Programme Manager, Advanced Lithography Development, Nikon Precision Europe, Mircea Dusa, Senior Scientist & ASML Fellow, ASML, The Netherlands, & Rainer Pforr, Principal Engineer, Future Lithography, Infineon Technologies, Dresden, Germany Read more >>

Matthew Purdy, Advanced Micro Devices Read more >>

Ashwin Ghatalia, Kranthi Adusimilli, Dave Dyer, Walter Worth, Robert Wright, Phil Naughton, Joel Barnett, Steve Burnett Read more >>

Mark Osborne, Editor-in-Chief, Semiconductor Fabtech Read more >>