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White Papers > Edition 17

Low k films for integrated circuit IMD applications: CVD or spin-on?

01 September 2002 | Edition 17
Neil H. Hendricks, ATMI, San Jose, CA, USA Read more >>

In-line electrical metrology for high-k gate dielectrics deposited by atomic layer chemical vapour d

01 September 2002 | Edition 17, Wafer Processing
H. De Witte & J.W.H. Maes, ASM International, Bilthoven, The Netherlands, S. Passefort, KLA-Tencor Corporation, Evry, France,W. Besling, Philips Research, Eindhoven, The Netherlands, K. Eason, KLA-Tencor Corporation, San Jose, CA, USA, E. Young, International SEMATECH, Austin, TX, USA, Z.M.Rittersma, Philips Research Leuven, Kapeldreef 75, 3001 Leuven, Belgium, M. Heyns, IMEC, Leuven, Belgium Read more >>

Extending silicon oxynitride gate dielectrics for the 90nm node

01 September 2002 | Edition 17, Wafer Processing
Benjamin Chow, Andy Hegedus, Pravin Narwankar, Chris Olsen, Gary Miner, Arnaud Lepert & Paul Meissner, Applied Materials, Read more >>