Online information source for semiconductor professionals

C. MARK MELLIAR-SMITH, International SEMATECH, Austin, TX, USA Read more >>

SHOU-NAN LI, JUNG-NAN HSU & GEN-HOU LEU, Industrial Technology Research Institute, CESH, Chutung, Taiwan
KIREL TANG & CHUNG-LING CHIU, BOC Edwards, Toufen Town, Taiwan Read more >>

ROGER H. FRENCH, JERALD FELDMAN, FREDRICK C. ZUMSTEG, MICHAEL K. CRAWFORD,
ANDREW E. FEIRING, VIACHESLAV A. PETROV, FRANK L. SCHADT III & ROBERT C. WHELAND,
DuPont Co., iTechnologies and Central Research and Development, Wilmington, DE, USA
JOSEPH GORDON & EDWARD ZHANG, DuPont Photomasks Inc., Danbury, CT, USA Read more >>

Consequences of ITRS Roadmap Acceleration for Device Makers on Advanced Lithography Integration into Development and Release of Technology

JAN-WILLEM GEMMINK, Philips Semiconductors, Nijmegen, The Netherlands
PETER ZANDBERGEN, Philips Semiconductors, Kapeldreef, Leuven, Belgium

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GEERT VANDENBERGHE, YOUNG-CHANG KIM, CHRISTIE DELVAUX, KEVIN LUCAS,
SANG-JUN CHOI, MONIQUE ERCKEN & KURT RONSE, IMEC, Leuven, Belgium
BERT VLEEMING, ASML, Veldhoven, Holland Read more >>

MARTINE RIBEYRON & MICHEL FUENTES, STMicroelectronics, Crolles, France ALAIN FERRERES, STMicroelectronics, Rousset, France Read more >>

ROBERT TORRES, JOSEPH VININSKI, BELGIN YUCELEN & VIRGINIA HOULDING, Matheson Tri-Gas Advanced Technology Center,
Longmont, CO, USA
DAVID TREADWELL, CP Industries, Inc., McKeesport, PA, USA
JOHN W. FELBAUM, Digital Wave Corporation, Englewood, CO, USA 

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JEAN M. FRIEDT, Air Liquide, Paris, France
HWA CHI WANG, RICK UDISCHAS, Air Liquide, Countryside, IL, USA
HERVE DULPHY, Air Liquide, Le Pont de Claix, France Read more >>

JILL C. HILDRETH, JEFFREY A. CHAN, ANDREW S. MORTON & HEATHER KRETZSCHMAR, Motorola Inc., Chandler, AZ, USA Read more >>

NOLAN KUAN, Applied Materials, Inc., Santa Clara, CA, USA Read more >>