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PAUL DELAUP, Lightning Elimination Systems, Covington, LA, USA
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Simultaneous Resolution of Multiple Environmental Issues: the Development of In-Situ RF Plasma Chamber Clean Processes Using Dilute NF3/He Mixtures

KENNETH A. AITCHISON, Novellus Systems, San Jose, CA, USA

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MARTIN L. SPARTZ, MATTHEW RICHTER, PETER A. ROSENTHAL & PETER R. SOLOMON,
On-Line Technologies, Inc., East Hartford, CT, USA Read more >>

Reproduced by permission of The Electrochemical Society, Inc.

LAURIE BEU & PAUL THOMAS BROWN, Motorola, Austin, TX, USA

ABSTRACT
Fluorinated compounds (FCs) are essential to the semiconductor manufacturing process for plasma chamber cleaning and plasma etching. Because FCs have extremely long atmospheric lifetimes and are strong infrared absorbers, efforts have been undertaken to identify methods to reduce atmospheric emissions. The U.S., Japanese, Korean and European semiconductor industries have established separate voluntary programs calling for the reduction of FC emissions; furthermore, at the World Semiconductor Council (WSC), efforts have begun to address FC emissions on an international basis with FC emissions reduction goals recently established. The Kyoto Protocol includes perfluorocarbons (PFC), hydrofluorocarbons (HFCs) and sulfur hexafluoride (SF6) in the basket of gases subject to voluntary emissions reduction goals in the 2008-2012 timeframe. Efforts to develop FC emissions reduction goals are complicated because emissions reduction technology is in the research and development stage with limited commercial availability and unknown applicability at wafer sizes greater than 200mm. Establishing goals is further complicated because the industry must predict growth over the next 10-15 years, and must determine the impact manufacturing and process changes will have on FC emissions over this time frame. This paper will provide an overview of FC emissions reduction technologies including effectiveness and cost to implement. The factors affecting establishment of long term FC emissions reduction goals will be discussed and several goal strategies and their impact on long-term emissions will be analysed.

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STEVE LERNER & CLAUDIO TRUZZI, CS2, Zaventem, Belgium Read more >>

JOHN SCHULER, SEMI Market Statistics Dept., SEMI, Mountain View, CA, USA
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STEVE HAUSLE, GW Associates, Sunnyvale, CA, USA Read more >>

STEVEN BUDDE, USDATA Corporation, Richardson, TX, USA
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An Analysis Tool to Determine the Components of Capacity and Cycle Time in a Semiconductor Manufacturing Line Read more >>

STEVEN M. PILGRIM, New York State College of Ceramics at Alfred University, Alfred, NY, USA Read more >>