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White Papers > Edition 10

The Role of Resists in Extending Optical Lithography

01 December 1999 | Edition 10, Lithography
RALPH R. DAMMEL, Clariant Corporation, Somerville, NJ, USA Read more >>

Some Challenges for Mask-Making to Keep Up With the Roadmap

01 December 1999 | Edition 10, Lithography
RIK JONCKHEERE, KURT RONSE & JAN WAUTERS IMEC, Leuven, Belgium Read more >>

Resolution Enhancement Techniques in Optical Lithography

01 December 1999 | Edition 10, Lithography
KURT RONSE & LUC VAN DEN HOVE, IMEC, Leuven, Belgium Read more >>

Defect Reduction Methodology in the Lithography Module

01 December 1999 | Edition 10, Lithography
INGRID B. PETERSON, KLA-Tencor Corporation, Milpitas, CA, USA Read more >>

A Fundamental Design Solution for Deep Ultra-Violet Coat/Develop Systems Beyond 250 nm

01 December 1999 | Edition 10, Lithography
LARRY DULMAGE, EDDIE LEE & JAE PARK, Silicon Valley Group, Inc., San Jose, CA, USA Read more >>

0.15µm Lithography with KrF

01 December 1999 | Edition 10, Lithography
WILL CONLEY, MIRCEA DUSA, ROBERT SOCHA, National Semiconductor Corp., Santa Clara, CA, USA
NIGEL FARRER, Hewlett-Packard Company, ULSI Research Labs, Palo Alto, CA, USA.
HAREEN GANGALA, Cypress Semiconductor, San Jose, CA, USA
CARL BABCOCK, AMD Corporation, Sunnyvale, CA, USA
HUA-YU LIU, Numerical Technologies Inc., Santa Clara, CA, USA Read more >>

Next-Generation Materials in Semiconductor Processing: Manufacturing, Handling and ESH Issues

01 December 1999 | Edition 10, Materials and Gases
GAUTAM BHANDARI, ATMI, Danbury, CT, USA Read more >>

A Feasibility Study of Chromium-Rich Oxide-Passivated Stainless Steel Tubing for Gas Delivery System

01 December 1999 | Edition 10, Materials and Gases
SOWMYA KRISHNAN & MOHAMED SALEEM, Ultra Clean Technology, Menlo Park, CA, USA Read more >>

A European Perspective on Electronic Chemicals

01 December 1999 | Edition 10
WOLFGANG J. SIEVERT, Riedel-de Haën GmbH, Seelze, Germany Read more >>

Value of an Optimized Test System for Advanced IC Design Validation, Characterization and Failure ..

01 December 1999 | Edition 10

Value of an Optimized Test System for Advanced IC Design Validation, Characterization and Failure Analysis

PETER BEGO & CHUCK WILEY, Integrated Measurement Systems, Beaverton, OR, USA

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