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White Papers > Edition 09

Complete Software Integration for Fab-Plants – The Way to High Flexibility and Profit

01 March 1999 | Edition 09, Fab Management
J. REDMAN & GRADY BARRENS, Ergotech, Los Alamos, NM, USA Read more >>

Activity Based Cost Planning – Modeling Fab Refurbishment and Greenfield Facilities

01 March 1999 | Edition 09, Fab Management
D. N. LAUBEN, Wright Williams & Kelly, Albuquerque, NM, USA
F. M. TRAYLOR, Wright Williams & Kelly, Austin, TX, USA Read more >>

The Development of Step and Scan

01 March 1999 | Edition 09, Lithography
DR HARRY SEWELL, SVG Lithography Systems, Inc., Wilton, CT, USA Read more >>

Sub-Wavelength Lithography Using OPC

01 March 1999 | Edition 09, Lithography
FRANK M. SCHELLENBERG, Mentor Graphics, Inc., Wilsonville, OR, USA Read more >>

Simulation for DUV-Lithography

01 March 1999 | Edition 09, Lithography
WOLFGANG HENKE, Fraunhofer Institut Siliziumtechnologie, Itsehoe, Germany Read more >>

Metrology Issues in the Age of Next Generation Lithography

01 March 1999 | Edition 09, Lithography
S. A. RIZVI, Photronics Inc., Milpitas, CA, USA Read more >>

193 nm Microlithography and DUV Light Source Design

01 March 1999 | Edition 09, Lithography
BERND NIKOLAUS, OLIVIER SEMPREZ, GERRY BLUMENSTOCK, PALASH DAS, Cymer, Inc., San Diego, CA, USA Read more >>

Semiconductor Wastewater Treatment and Reuse

DR. STEVE ALLEN AND DR. MICHAEL R. HAHN, Microbar Incorporated, Sunnyvale, CA, USA Read more >>

Pushing the Envelope

CLIFF FIELDS, Newark, CA, USA
Read more >>

Investigation of Calcium Adsorption on Wafer Surfaces from Deionized Water

ASHUTOSH MISRA AND BUD L. SCHMIDT, Air Liquide Electronics Chemicals & Services, Inc., Dallas, TX, USA
LINDSEY HALL, JENNIFER SEES AND TRACE Q. HURD, Texas Instruments, Inc., Dallas, TX, USA Read more >>