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White Papers > Cleanroom

Design for Energy Efficiency Adds Value to Semiconductor Company Shareholders

01 December 1999 | Edition 10, Cleanroom
CHRIS ROBERTSON, Chris Robertson and Associates, Portland, OR, USA Read more >>

Construction Challenges for the 300 mm Fab

01 December 1999 | Edition 10, Cleanroom
ALLAN D. CHASEY & SALONI MERCHANT, Arizona State University, Tempe, AZ, USA Read more >>

Activity-Based Fab Cost-of-Ownership Modelling for Prediction and Optimization of Profitability

01 December 1999 | Edition 10, Cleanroom
TONY WELLS & JULIE PADDON, M+W Zander Facility Management UK Ltd, Newcastle upon Tyne, UK Read more >>

Fab Design and Development Methodology Must Change to Allow for Successful Integration of All System

01 June 1999 | Edition 10, Cleanroom
THERON D. COLVIN, PRI Automation, Mesa, AZ, USA
GERALD T. MACKULAK, Arizona State University, Tempe, AZ, USA Read more >>

Preventing Fires in Semiconductor Cleanrooms

01 March 1999 | Edition 09, Cleanroom
LAWRENCE SHEA, Shea Technology, Reno, NV, USA Read more >>

Point-of-Use Exhaust Control for Semiconductor Manufacturing: Saving Energy, Saving Money, Improving

01 March 1999 | Edition 09, Cleanroom

Point-of-Use Exhaust Control for Semiconductor Manufacturing: Saving Energy, Saving Money, Improving Yield

DANIEL HALL, Progressive Technologies Inc., Tewksbury, MA, USA 

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Effective Construction Cost and Schedule Control

01 March 1999 | Edition 09, Cleanroom
M. EL-MASHALEH, Royal Corps of Engineers, Jordan Armed Forces, Jordan
DR. A.D. CHASEY, Arizona State University, Tempe, AZ, USA Read more >>

Designing Chilled-Water Systems for the 21st Century

01 March 1999 | Edition 09, Cleanroom
J. W. BENSON, The Trane Company, La Crosse, WI, USA Read more >>

Benchmarking Wafer Fabrication Process Tool Hook-up A Proposed Standard Methodology for the…

01 March 1999 | Edition 09, Cleanroom

Benchmarking Wafer Fabrication Process Tool Hook-up A Proposed Standard Methodology for the Industry

A. WELLS, Siemens Microelectronics Ltd., Newcastle on Tyne, UK

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