Online information source for semiconductor professionals
The IMEC Clean: Implementation in Advanced CMOS Manufacturing
Popular articles
Micron moving fast on Hynix in Q208 NAND flash rankings, says iSuppli - 19 August 2008
Numonyx to close California Technology Center - 12 August 2008
Qimonda starts major reorganization: exits PC DRAM market - 13 October 2008
Applied Materials sees higher CapEx spending for 2009 - 15 August 2008
Micron close to Inotera share purchase, says Gartner - 06 October 2008
I. TEERLINCK, R. VOS, L. LOEWENSTEIN & M. M. HEYNS, IMEC, Leuven, Belgium
KLAUS WOLKE, STEAG Microtech, Pliezhauzen, Germany
ABSTRACT
This article describes an implementation of the IMEC Clean for pre-diffusion cleans in a CMOS process. To avoid metal contamination HCl is added to the dilute HF. This also ensures particle removal. The particle removal and metal removal efficiencies are compared with those of an RCA clean. The results of monitoring of particle levels over 18 months and Fe concentration over a year are presented. The cost of ownership is also compared with that of an RCA clean.
 |
Please login to download the paper. No account yet? Please register. It's free! |