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The IMEC Clean: Implementation in Advanced CMOS Manufacturing
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I. TEERLINCK, R. VOS, L. LOEWENSTEIN & M. M. HEYNS, IMEC, Leuven, Belgium
KLAUS WOLKE, STEAG Microtech, Pliezhauzen, Germany
ABSTRACT
This article describes an implementation of the IMEC Clean for pre-diffusion cleans in a CMOS process. To avoid metal contamination HCl is added to the dilute HF. This also ensures particle removal. The particle removal and metal removal efficiencies are compared with those of an RCA clean. The results of monitoring of particle levels over 18 months and Fe concentration over a year are presented. The cost of ownership is also compared with that of an RCA clean.
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