Online information source for semiconductor professionals

The Advanced 200 mm Fab

Popular articles

Voltaix names Peter Smith as CEO - 09 November 2011

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

MITCHELL WEISS, PRI Automation, Billerica, MA, USA

ABSTRACT

Device makers must increase the productivity of process tools because of increasing capital costs. The transition to 300 mm wafers is not expected to start until 2001, so the industry must find a way to add incremental capacity. This will require a combination of technology enhancements (shrinks) and productivity improvements (logistics). Technology enhancements can be achieved by the use of deep ultraviolet and copper interconnects. Productivity enhancements can be obtained with the help of guidelines originally devised for 300 mm fabs. These will lead to new automated material-handling systems and new scheduling software. The benefits of applying these to 200 mm fabs are described.
Download Please login to download the paper. No account yet? Please register. It's free!

Related jobs

No related jobs found, sorry!

Related articles

Advances in Airborne Molecular Contamination in 300 mm Process Technology - 01 March 2002

High-k/metal gate transistor scaling and device concerns for advanced CMOS device applications - 01 August 2004

Ferrotec boosts furnaceware offerings with acquisition of Integrated Materials - 13 July 2010

Yuval Wasserman named new COO at Advanced Energy - 07 April 2009

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: