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FRANK M. SCHELLENBERG, Mentor Graphics, Inc., Wilsonville, OR, USA

ABSTRACT

For the progression of Moore’s Law to continue, subwavelength lithography will be routinely required. In this situation, lithographic pattern fidelity can deteriorate dramatically. Correction of these effects and the restoration of pattern fidelity can be accomplished by pre-compensation of the IC design through the application of OPC technology. This originally stood for “Optical proximity Correction”, but now more generally represents “Optical and Process Correction”. A range of OPC styles, both rules based and model based, are possible. The various styles of OPC, suitable insertion points and techniques for manufacturable OPC are discussed.