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Spectroscopic Ellipsometry (SE) for materials characterization at 193 and 157nm
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J. N. Hilfiker, J.A.Woollam Co., Inc. Lincoln, NE, USA. F. G. Celii,W. D. Kim, E. A. Joseph, C. Gross, T. Y. Tsui, R. B.Willecke & J. L. Large, Texas Instruments, Dallas, TX, USA. D. A. Miller, International SEMATECH, Austin, TX, USA
ABSTRACT
New SE tools measuring into the vacuum ultraviolet (VUV) allow accurate thin film metrology at 193 and 157nm. This article reviews characterization of photoresist, anti-reflection, and hardmask candidate coatings using SE. Optical characterization of these layers allows simulation and optimization of the lithography process.
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