Online information source for semiconductor professionals

Robustness evaluation and improvement method for automated material handling systems

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

R. Sturm & K. Reddig, Fraunhofer Institute Manufacturing Engineering and Automation Stuttgart, Germany. D. Glüer, Advanced Micro Devices Saxony LLC & Co. KG, Dresden, Germany


Planning and operating automated material handling systems (AMHS) for microelectronics and semiconductor manufacturing have become increasingly important for modern high-volume production lines. As a service system for the manufacturing process, reliable material supply to the process equipment is mandatory, and the scope of operating an AMHS is on the prompt. To ensure and improve the quality of AMHS, an approach for measuring and quantifying the AMHS performance of alternative planning variants is required. Fraunhofer IPA and AMD have developed an approach for robustness evaluation of AMHS configurations. This approach is very efficient when comparing alternative planning variants and different configuration parameters of the system, in order to provide both cost efficient and reliable material delivery.

Download Please login to download the paper. No account yet? Please register. It's free!

Related articles

Automated handling: Unsung hero or enemy of the state? - 01 June 2005

New Product: Aquest Systems ‚??FabEX‚?? boosts 300mm wafer moves - 11 December 2007

Aquest Systems adds new customers for its ‚??FabEX‚?? AMHS solutions - 06 May 2008

Tool Order: CHAD Industries sells first WaferMate system into China - 22 March 2010

Turning Crystal Growth on Its Side: A Revolutionary New Crystal Technique for Next-Generation Photol - 01 December 2002

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: