Online information source for semiconductor professionals

Resolution Enhancement Techniques in Optical Lithography

01 December 1999 | By Mark Osborne | White Papers > Edition 10, Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011



Resolution enhancement techniques for optical lithography have been investigated for many years. Pioneering work on phase shifting masks for optical lithography was reported in 1982 by M.D. Levenson, ref. [1], but the real boom of research on resolution enhancement techniques took place in the early 90s. Nevertheless, more than 8 years later, only very few of these techniques are being used in the production of integrated circuits. In this paper, the status of the various enhancement techniques is reviewed, their capabilities illustrated and their challenges discussed. In conclusion, an attempt is made to predict the insertion of these techniques in manufacturing.
Download Please login to download the paper. No account yet? Please register. It's free!

Related articles

The Role of Resists in Extending Optical Lithography - 01 December 1999

Tool Order: Chartered selects double-patterning solutions from Brion - 02 November 2009

Simulation for DUV-Lithography - 01 March 1999

New Product: New mask etcher from Applied Materials enables aggressive OPC techniques - 19 April 2007

Strained silicon push puts AMD into R&D project - 04 February 2005

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: