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Optical Digital Profilometry: A Breakthrough Technology for Non-Destructive Inline Profile and CD Me

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KELLY BARRY, MIKE LAUGHERY, NICKHIL JAKATDAR & WENGE YANG, Timbre Technologies Inc., Fremont, California, CA, USA


Optical digital profilometry is an optical technology that provides inline critical dimension, crosssectional profile, and film thickness information on wafers in a single measurement non-destructively. It can be used in most of photolithography and plasma etching process steps for process monitoring, control, development, and fault detection. It provides better CD measurement precision, repeatability, and can be extended to sub-100-nm technologies and beyond.

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