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On-line spectral analysis of line edge roughness: algorithms qualification and transfer to etch
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L.H.A. Leunissen, IMEC, Leuven, Belgium, G. F. Lorusso, T. DiBiase, H. Yang & A. Azordegan, KLA-Tencor Corporation, San Jose, CA, USA
ABSTRACT
A variety of LER estimators, such as standard deviation, peak-to-valley, average, correlation length and Fourier analysis, have been implemented on-line on CD-SEM, thus allowing fully automated LER monitoring. The algorithms were tested on e-beam written LER standards (both deterministic and random), demonstrating good performance in terms of precision and accuracy. This approach was used to investigate experimentally LER transfer to etch.
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