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S. A. RIZVI, Photronics Inc., Milpitas, CA, USA

ABSTRACT

The role of metrology with the advent of next generation lithography is going to be even more crucial than ever before. One reason is of course the high degree of tolerance demanded of the continued shrinking features; but then there are other factors that make the new metrology even more challenging. Features made of new materials may respond differently to the measuring instruments ; this may especially be true in the case of masks that are made for different types of lithographic systems. Physics involved in different types of measurement techniques can also provide outputs that may be difficult to correlate. Most importantly it is the lack of a sound statistical basis for handling nano and sub-nano metrology that presents potential difficulties in coming years. This paper explores areas of metrology that, though ignorable in the past, are beginning to play a significant role when required to support the New Generation Lithography.