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Metrology challenges for the photolithography masks
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M. Dilger, F. Gans & J.H. Peters, Advanced Mask Technology Center GmbH & Co. KG, Dresden, Germany
ABSTRACT
Metrology is not only used to measure the size of structures on photolithography masks for a verification of conformance with the customer specifications. A major part of the metrology tool time is usually devoted to process development and pattern structures deviating from the ideal shapes need to be analysed for process tuning. Current tools usually treat the mask as a 2-dimensional object, which for the future technologies is no longer a valid concept. Furthermore, in some cases there is a strong interference between the object to be measured and the measurement technique itself. AMTC is working on concepts and measuring methods to accelerate the process development.
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