Online information source for semiconductor professionals

Methods and devices used in the ROR (rate of rise) system calibration

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

F. Somboli & G. Fazio, STMicroelectronics, Italy


The pressure rate of rise is a standard method to test for leaks in vacuum systems, and to control/calibrate MFCs (mass flow controller). Unfortunately, the calibration of ROR sensors is often neglected. In this way, there is the risk to perform controls using equipment that could be worse than the tested system. In this paper we describe a method and a simple device to calibrate, quickly and accurately, the pressure ROR system. The suggested device can help engineers to avoid the above-described problem.

Download Please login to download the paper. No account yet? Please register. It's free!

Related articles

Towards Polynomial Correction Factors for Digital Mass Flow Controllers - 01 March 2000

Improved methodologies for the prediction of footfall-induced vibration - 01 December 2005

Qualification of components for high purity water, chemical and slurry systems - 01 December 2007

New Product: Nikon‚??s NSR-S610C immersion tool uses 1.30 NA catadioptric lens for sub-45nm patterni - 20 September 2006

UMC puts US$400 million cap on CapEx for 2009: fab utilization rate at 30% - 30 April 2009

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: