Online information source for semiconductor professionals

MES Integration Assessment and Influences on IT Projects

Popular articles

Micron moving fast on Hynix in Q208 NAND flash rankings, says iSuppli - 19 August 2008

Numonyx to close California Technology Center - 12 August 2008

Qimonda starts major reorganization: exits PC DRAM market - 13 October 2008

Applied Materials sees higher CapEx spending for 2009 - 15 August 2008

Micron close to Inotera share purchase, says Gartner - 06 October 2008

MARK SUNTRUP & JOHANN DORNER, Fraunhofer Institute of Manufacturing Engineering
and Automation (Fraunhofer IPA), Stuttgart, Germany

ABSTRACT

Current manufacturing execution systems (MES) in the semiconductor industry have been extended by the fab’s information technology (IT) staff in diverse directions in order to meet user requirements. Hence, the projects required to move towards more high tech IT structures and concepts will not be straight forward. Many individual applications (from special reporting programs to spreadsheets with complex macro programming) will have to be conside red. To search for the reasons behind this we need to ask why change the system at all, i.e., which driving forces exist? This article discusses the problem of individual MES extensions and the basic motives of carrying out such “improvement” and migration projects. We will see the interdependencies of the diverse forces and will obtain a statement of their individual character. The conclusion will show some of the investigated forces in another interesting light.

Download Please login to download the paper. No account yet? Please register. It's free!

Related jobs

Principal Engineer - FTIR Gas Analysis Algorithms - MKS Instruments, Inc. - Methuen, 07 October 2007

Principal Embedded Software Engineer - MKS Instruments, Inc. - Wilmington, 05 September 2007

Staff R&D Engineer - Synopsys - Mountain View, 23 August 2007

Yield Ramp Consultant - Synopsys - Austin, 23 August 2007

Technical Support Engineer - Carl Zeiss SMT, Inc. - Peabody, 10 August 2007

Related articles

Process optimization – the key to obtain highly reliable Cu interconnects - 01 December 2003

Nearly 50% fall in semiconductor equipment sales, says VLSI Research - 21 November 2008

Effective Construction Cost and Schedule Control - 01 March 1999

X-ray metrology for front-end applications - 01 December 2004

EHS Analysis of Advanced CVD Processes - 01 December 2002

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: