Online information source for semiconductor professionals

Measurement of Advanced Low K Materials

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

KLA - Tencor Corporation, Milpitas, CA, USA


Many new materials are being considered as potential candidates for low dielectric constant (low k) applications. It is envisioned that such materials will be used in multiple layer filmstacks based on Cu and dual damascene processes using CMP. Some of these materials are birefringent, i.e. the optical properties are not isotropic. Critical to the success of these materials is the ability to non-destructively measure the thickness and quality of the films. Recently, we conducted a study on the optical characterization and measurement of several polymeric low k materials. The results of this study are discussed in this paper. The materials studied were benzocyclobutene polymers (BCB) and SiLKT M from Dow Chemical and parylene (AF-4) from Novellus. Parylene AF-4 is highly birefringent. A special algorithm was developed at KLA - Tencor for the measurement and characterization of such anisotropic, birefringent films.

Download Please login to download the paper. No account yet? Please register. It's free!

Related articles

Measurement of Advanced Low K Materials - 01 March 1999

Optical Digital Profilometry: A Breakthrough Technology for Non-Destructive Inline Profile and CD Me - 01 December 2002

SUSS MicroTec joins FEP program at SEMATECH - 10 December 2009

New Product: Vistec offers photomask CD measurement down to 32nm - 12 March 2007

New Product: Nova‚??s ‚??MatMaker,‚?? solution significantly cuts optical CD measurement time - 02 July 2009

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: