Online information source for semiconductor professionals

Manufacturable strained silicon technology

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

P.R. Chidambaram, Texas Instruments, Richardson, TX, USA


In the last year most semiconductor manufacturers have announced the use of some form of strain enhancement in their production technology [1-4]. Strain is the most popular means of realizing the required node-on-node transistor performance improvements in recent times. This article will review the most popular and manufacturable strained silicon technologies.

Download Please login to download the paper. No account yet? Please register. It's free!

Related articles

Applied Materials and AmberWave in strained silicon pact - 04 February 2005

Strained silicon push puts AMD into R&D project - 04 February 2005

SMIC yields on first HiPo 45nm wafer lots - 30 June 2009

Imec starts new industrial affiliation program to explore high-bandwidth optical I/O - 25 January 2011

AmberWave claims more strained silicon patent infringements against Intel - 29 September 2005

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: