Online information source for semiconductor professionals
Low-k Dielectrics for Future IC Fabrication
Popular articles
Voltaix names Peter Smith as CEO - 09 November 2011
Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010
TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
ABSTRACT
New dielectric materials offering lower dielectric constants than silicon dioxide are needed for the manufacture of faster computer chips. In this article we survey the challenges involved in finding the right material.
 |
Please login to download the paper. No account yet? Please register. It's free! |