Online information source for semiconductor professionals
Ion Chromatography and Capillary Electrophoresis in Large-Scale Manufacturing of Semiconductor Silic
Popular articles
Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
Samsung and Micron gain most market share in DRAM crisis - 17 February 2009
THOMAS EHMANN, LASZLO FABRY, JAMES MORELAND & JÜRGAN HAGE,Wacker Siltronic AG, Burghausen, Germany
MARIA SERWE, Agilent Technologies GmbH, Waldbronn, Germany
ABSTRACT
Crystalline perfection and cleanliness of silicon wafers are becoming limiting factors for increasing integration density of semiconductor devices. Both crystalline perfection and cleanliness of the wafers depend upon the cleanliness of process chemicals, process environment and process variations. Monitoring process hygiene requires sophisticated ultratrace microanalytical techniques that are capable to control process cleanliness and to assure product quality down to the lower ppt-range (pg/ml) [1,2]. As a rule of thumb, reference materials, analytical environment and analytical chemicals must be one order of magnitude cleaner than the process conditions to allow dependable analytical results on processes and products.
 |
Please login to download the paper. No account yet? Please register. It's free! |