Online information source for semiconductor professionals
Intrinsic Equipment Effectiveness (IEE)
Popular articles
Micron moving fast on Hynix in Q208 NAND flash rankings, says iSuppli - 19 August 2008
Numonyx to close California Technology Center - 12 August 2008
Qimonda starts major reorganization: exits PC DRAM market - 13 October 2008
Applied Materials sees higher CapEx spending for 2009 - 15 August 2008
Micron close to Inotera share purchase, says Gartner - 06 October 2008
P. PATRUNO, International Sematech, Austin, TX, USA
ABSTRACT
The advent of 300mm technology into active production may well have profound implications on the currently accepted international standard s . A revision of standards is proposed in the SEMI document 2679. This document is examined and discussed in detail. Further definitions of terminology have been proposed which render the valuation of the productivity of process and metrology equipment more effectively to those on the shop floor.
 |
Please login to download the paper. No account yet? Please register. It's free! |