Online information source for semiconductor professionals

Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography

01 December 2002 | By Mark Osborne | White Papers > Edition 15, Lithography

Popular articles

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

JOHN H. BURNETT, ZACHARY H. LEVINE & ERIC L. SHIRLEY,
National Institute of Standards and Technology, Gaithersburg, MD, USA

ABSTRACT

Calcium fluoride and other crystalline fluoride materials are being exploited for latestgeneration lithography optics, making up a significant component of the optics of 193 nm lithography systems and being potentially the exclusive optical materials for 157 nm systems. Improvements in the crystalline material quality seemed to have brought the most troubling material property, stress-induced birefringence, into specification. However, we have recently shown that these materials also have a completely overlooked intrinsic birefringence far over specifications. This has significant implications for lithography system design and performance, especially for 157 nm lithography. We discuss the effect, its impact on lithography optics and how system designers are attempting to compensate for the effect.

Download Please login to download the paper. No account yet? Please register. It's free!

Related articles

The Role of Resists in Extending Optical Lithography - 01 December 1999

New Product: Pixer enables high speed, high resolution DUV metrology of mask blanks - 21 February 2008

Ion Chromatography and Capillary Electrophoresis in Large-Scale Manufacturing of Semiconductor Silic - 01 June 2000

Measurement of Advanced Low K Materials - 01 March 1999

Resolution Enhancement Techniques in Optical Lithography - 01 December 1999

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: