Online information source for semiconductor professionals
Intrinsic Birefringence in Crystalline Optical Materials for 193 nm and 157 nm Lithography
Popular articles
Voltaix names Peter Smith as CEO - 09 November 2011
Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010
TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
JOHN H. BURNETT, ZACHARY H. LEVINE & ERIC L. SHIRLEY,
National Institute of Standards and Technology, Gaithersburg, MD, USA
ABSTRACT
Calcium fluoride and other crystalline fluoride materials are being exploited for latestgeneration lithography optics, making up a significant component of the optics of 193 nm lithography systems and being potentially the exclusive optical materials for 157 nm systems. Improvements in the crystalline material quality seemed to have brought the most troubling material property, stress-induced birefringence, into specification. However, we have recently shown that these materials also have a completely overlooked intrinsic birefringence far over specifications. This has significant implications for lithography system design and performance, especially for 157 nm lithography. We discuss the effect, its impact on lithography optics and how system designers are attempting to compensate for the effect.
 |
Please login to download the paper. No account yet? Please register. It's free! |