URS NATZSCHKA, MICHAEL SCHULZ-GROSSER & RAINER SCHUHMANN, Linos Photonics GmbH, Goettingen, Germany
UWE LEINHOS, OLIVER APEL & KLAUS MANN, Laser Laboratorium, Goettingen, Germany
Semiconductor devices demand shorter wavelengths to keep optical lithography as the mainstay of device fabrication. In the deep UV optical components require ever more stringent control to obtain long working life and cost effectiveness. The causes of optical component degradation and failure are examined and the critical areas of measurement and quality control for DUV exposure systems are explained in detail.