Online information source for semiconductor professionals
Fast, In-line Copper Metrology Using Optoacoustics
Popular articles
Micron moving fast on Hynix in Q208 NAND flash rankings, says iSuppli - 19 August 2008
Numonyx to close California Technology Center - 12 August 2008
Qimonda starts major reorganization: exits PC DRAM market - 13 October 2008
Micron close to Inotera share purchase, says Gartner - 06 October 2008
Applied Materials sees higher CapEx spending for 2009 - 15 August 2008
ALEC READER, MICHAEL GOSTEIN, JOSHUA TOWER & CHRIS MOORE, Philips Analytical, Almelo, The Netherlands
ABSTRACT
The introduction of copper as the conductor of choice in circuit interconnects has led to new manufacturing challenges and a need for nontraditional metrologies. Successful production will demand cost-effective, non-destructive monitoring of metal film thickness in real time. This goal of real-time feedback from product wafers is now within reach using optoacoustic metrology. The article discusses a project involving Philips Analytical and International SEMATECH on optoacoustics for copper metrology, and compares the measurements to traditional results from electrical tests and profilometry. It also outlines the potential for in-line or integrated process control.
 |
Please login to download the paper. No account yet? Please register. It's free! |