Online information source for semiconductor professionals

Fab Layout for 300mm Mass-Production Lines

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

 KWON-SU PARK, SEOK-HEE PARK & SEUNG-HOON AHN, Samsung Semiconductors, Kyunggi-Do, Korea


What will 12 inch semiconductor fabs look like? There has been so much effort to establish standards and guidelines for 12 inch semiconductor fabs that we may feel that the era of 12 inch fabs has already come, and wait for high-volume production. But there still exists a question mark. This article covers several topics, ranging from defining the initial layout design concept to analysing the layout from the viewpoint of material flow.

Download Please login to download the paper. No account yet? Please register. It's free!

Related articles

Renesas to resume Naka factory operations earlier than planned - 11 May 2011

Elpida to ramp 30nm DRAM in May - 28 April 2011

Tool Order: GaAs IC manufacturer placed follow-on order with Metryx for mass metrology system - 21 April 2009

Elpida breaks-up monolithic memory mega-fab - 01 July 2009

Toshiba & SanDisk stop NAND flash production to reduce supply - 16 December 2008

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: