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Extreme Ultraviolet Lithography: status and challenges ahead
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Vivek Bakshi, Jerry Cullins, N.V. Edwards, Kevin Kemp, Pat Marmillion, Jan-Peter Urbach, Thomas White & Obert Wood, International SEMATECH, Austin, TX, USA
ABSTRACT
The purpose of this article is to provide an update of the current status and most recent advances in each of the specific areas of sources, masks, optics, photoresists and microexposure tool for extreme ultraviolet lithography. The article is therefore organized according to these topics, with a brief discussion of the issues surrounding each, the current development status, and future outlook. A sustained study on the development of industry infrastructure for EUVL is underway at International SEMATECH. Although significant challenges remain, progress is being made on various technical fronts.
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