Online information source for semiconductor professionals

Edition 38: Evaluation of particle shedding and trace metal extraction from high purity pumps

25 February 2009 | By Síle Mc Mahon | White Papers >

Popular articles

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

FT38Evaluation of particle shedding and trace metal extraction from high purity pumps - Mark R. Litchy, CT Associates, Inc., Minnesota, USA & Reto Schoeb, Levitronix, LLC, Massachusetts, USA.

ABSTRACT

The production of semiconductor devices continues to be extremely sensitive to particulate and metallic contamination. As feature sizes continue to decrease, the need for purity will continue to increase. Various types of pumps are used in bulk chemical delivery systems, recirculating etch baths, and other high purity process applications. Many of these pumps shed significant quantities of particles that may reduce product yield or impact the performance or lifetime of filters used in the process loop. Furthermore, metallic contamination in process chemicals can cause a variety of yield-related issues. This paper evaluates the levels of trace metal extraction and particle shedding under different operating conditions using two high purity pump types from three manufacturers.

Download Please login to download the paper. No account yet? Please register. It's free!

Related articles

PFA trace metals leaching ‚?? determining future improvements in bulk chemical delivery distribution - 01 June 2006

SEMI¬ģ F57-0301 and beyond: Advancing standards for ultra high-purity fluoropolymer components - 01 August 2005

Effect of pump type on the health of various CMP slurries - 01 April 2007

The IMEC Clean: Implementation in Advanced CMOS Manufacturing - 01 March 2000

Contamination-free liquid-flow controller - 01 December 2003

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: