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Discussion topic: latest developments in EUV light sources

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Discussion panel contributors include: Dr. Vivek Bakshi, SEMATECH, Austin, Texas, USA, Dr. Martin
McCallum, Manager, Advanced Lithography and Technology, Nikon Precision Europe GmbH, & Dr. Vadim
Banine, ASML, Veldhoven, The Netherlands


Significant improvements in EUV light sources have been made in the last 12 months, resulting in renewed
hope that one of several key barriers to the eventual adoption of EUV
as the mainstream lithography technology below the 32nm node
may be close to being overcome. Development work has been carried
out around the world and within key working groups. We asked some of
these groups to provide insight into what has been achieved and what is
still needed to be done before EUV lithography shows the light of day!

Mark Osborne, Semiconductor Fabtech, Editor-in-Chief

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