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Cost-Of-Ownership Analysis For 300 mm Lithography Mix-and-Match Applications

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YUAN ZHANG KE & PHIL WARE, Canon USA, Inc, Semiconductor Equipment Division, Irving, TX, USA
KENICHI KOTOKU & YUIICHI YAMADA, Canon Inc, Semiconductor Production Equipment Group, Utsunomiya, Japan

ABSTRACT

Commercial software for cost-of-ownership (CoO) analysis, such as TWO COOLTM, is suitable for generic fab equipment evaluation. But the evaluation of optical-lithography equipment and process strategies requires a more sophisticated approach. International SEMATECH has provided highly useful information on lithography throughput modelling through its CoO programmes. This article addresses the appropriateness of the TWO COOLTM and International SEMATECH lithography CoO models in terms of the architecture and assumptions that are essential to advanced lithography modelling. It proposes a CoO model based on refractive projection optics lens design. It then presents a case study in which different mix-and-match strategies are used for 200 mm and 300 mm applications. Finally, this article applies the implications of the case study to the matter of using scanners and steppers together, versus an all-scanner strategy, and recommends an optimal 300 mm mix-and-match solution.

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