Online information source for semiconductor professionals

Contamination-free liquid-flow controller

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

Dave Wehrs & Chuck Gould, NT International & Huaping Wang, Entegris, Inc.

ABSTRACT

The accurate control of liquid flow is critical for attaining high process yields in wet etch, CMP delivery, and on-demand chemical blending applications. To maintain high purity, a flow control technology must minimize particle addition to the fluid stream. This article will present laboratory data to demonstrate the low levels of particle generation associated with the use of a differential pressure (DP)-based flow controller. The flow controller performs closed-loop control using direct flow and pressure measurement, and is used for in-situ monitoring and control of a process liquid flow rate. Differential pressure flow measurement technology allows this device to measure liquid flow rate without the use of moving parts. The flow controller’s valve technology provides control with low particle addition to the fluid stream during actuation. The valve seat and diaphragm are designed to minimize dead volume and fluid shear, reducing the possibility of process contamination. Also, to avoid excessive movement, the valve diaphragm actuation stroke is minimized. Testing was completed under three different conditions that represent probable-use cases of the device. Test results indicate low levels of particle generation during flushing and normal operation of the device confirming that semiconductor equipment users can use the flow controller for high-purity applications sensitive to particle generation. This provides users with another tool for managing materials integrity.

Download Please login to download the paper. No account yet? Please register. It's free!

Related articles

Towards Polynomial Correction Factors for Digital Mass Flow Controllers - 01 March 2000

New Product: Entegris offers ‚??Torrento‚?? high-flow liquid filters for wet etch and clean processe - 17 December 2007

New Product: Levitronix‚??s ‚??BPS 600‚?? maglev pumps eliminate CMP slurry particle agglomeration - 14 May 2008

Brooks Instrument Completes Acquisition of Celerity’s Instrumentation Division - 25 June 2009

Airborne Molecular Contamination Control in Semiconductor Fabs: A Practical Approach - 01 March 2002

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: