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Contamination control for the 32nm node

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Twan Bearda, Rita Vos, Paul W. Mertens, Gabriela Catana & Cedric Huyghebaert, IMEC, Leuven, Belgium


The need to incorporate new materials with every new generation of devices has created a completely new situation for contamination control and cleaning. Cleaning technologies that can remove contaminants without attaching these new materials need to be developed. We also need to change our perception of what contamination is and how it should be controlled.

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