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Compositional Metrology™, A New Tool for Yield Enhancement

01 December 1999 | By Mark Osborne | White Papers > Edition 10

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KENTON D. CHILDS, STEPHEN P. CLOUGH & DENNIS F. PAUL, Physical Electronics, Eden Prairie, MN, USA

ABSTRACT

One of the major challenges for yield enhancement is the ability to accurately identify defects or particles; optical and SEM methods are insufficient. Compositional Metrology™, which provides the defect composition, can furnish the additional information needed. This technique uses Auger electron spectroscopy for compositional analysis. Results of the application of the technique to several defects are described.
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