Online information source for semiconductor professionals
Characterisation of Porous Low Dielectric Constant Films by Ellipsometric Porosimetry
Popular articles
Voltaix names Peter Smith as CEO - 09 November 2011
Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010
TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
MIKHAIL R. BAKLANOV & KONSTANTIN P. MOGILNIKOV, XPEQT, Tessenderlo, Belgium
ABSTRACT
Ellipsometric porosimetry (EP) is an effective method for characterisation of porosity, pore size distribution (PSD) and specific surface area in porous Low-K films. The films can be deposited on top of any smooth substrate. EP is a new modification of the adsorption porosimetry. In situ ellipsometry is used to determine the amount of adsorptive which adsorbed/condensed in the film. Change in refractive index is used to calculate of the quantity of adsorptive present in the film.
 |
Please login to download the paper. No account yet? Please register. It's free! |