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CARL – Benefits of an Advanced Shrink Technology for Thin Film Imaging
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ERNST RICHTER, MICHAEL SEBALD, LINDA CHEN, GÜNTER SCHMID & GÜNTHER CZECH, Infineon Technologies AG, Erlangen, Germany
ABSTRACT
The process of chemical amplification of resist lines (CARL) is outlined in this article. An improvement in depth of focus in lithography operations is achieved leading to improved resolution of features in ICs. This new concept is already being implemented in some production environments.
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