Online information source for semiconductor professionals
Broadband spectrophotometry for phase-shift-mask metrology
Popular articles
Voltaix names Peter Smith as CEO - 09 November 2011
Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010
TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
Phillip Walsh, George Li & A. Rahim Forouhi, n&k Technology, Inc
ABSTRACT
We present a method based on broadband spectrophotometry in conjunction with Forouhi–Bloomer dispersion equations and hybridrigorous coupled wave analysis (RCWA) for monitoring film thickness, film optical properties, trench parameters, and phase shift in phase-shift masks. The method, known as the n&k method, has certain advantages over conventional metrology in terms of throughput and suitability for integration into the mask creation process. At the same time, the n&k method has demonstrated excellent correlation with conventional metrology methods.
 |
Please login to download the paper. No account yet? Please register. It's free! |