Online information source for semiconductor professionals

Balancing Power and Fuel Usage of PFC Abatement Options for Minimisation of Etch Tool Global Warming

01 December 2002 | By Mark Osborne | White Papers > Edition 15

Popular articles

Voltaix names Peter Smith as CEO - 09 November 2011

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

ERIC J. TONNIS, Litmas Inc., Charlotte, NC, USA

ABSTRACT

As part of the semiconductor industry’s Partnership for PFC Emissions Reduction program, many fabs are actively evaluating several kinds of PFC abatement systems. Each of these abatement methods uses external energy from either electricity or from fuel combustion to destroy the thermodynamically stable PFCs emitted by semiconductor etch and CVD processes. The production and use of these energy sources results in global warming emissions that detract from the overreaching goal of reducing the global warming footprint of semiconductor processing tools. In this article, the global warming trade-offs between energy usage and PFC abatement are explored with example calculations showing how these trade-offs affect the overall global warming reduction efficiency of sample abatement devices.

Download Please login to download the paper. No account yet? Please register. It's free!

Related jobs

No related jobs found, sorry!

Related articles

TEL and Edwards to develop PFC abatement system for dielectric film etching processes - 25 November 2008

Solar Tool Order: Advent Solar orders multiple PECVD abatement systems from Edwards - 05 September 2007

New Product: PoU abatement system from TecHarmonic reaches 95 percent DRE - 29 June 2006

SEMICON West Sustainable Technologies Award finalists revealed - 13 July 2010

New Product: Edwards ‘Sirius 6000’ plasma abatement system targets etch processes - 08 December 2008

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: