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An Overview of Cost of Ownership for Optical Lithography at the 100 nm and 70 nm Generations

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ED MUZIO*, PHIL SEIDEL, GIL SHELDEN & JOHN CANNING,
International SEMATECH, Inc., Austin, TX, USA, *Intel Corporation Assignee

ABSTRACT

The cost of ownership (CoO) has become a key parameter in the comparison of lithography technologies. This article presents some results from the CoO modelling technique used by International SEMATECH, with specific focus on cost drivers and sensitivities. The principal drivers of the CoO values are mask usage, mask cost, tool throughput, and tool cost. By examining trends in these and other areas, one can identify the areas of highest leverage for proactive cost reduction efforts.
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