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Advanced Mask-Making with a Variable-Shaped Electron Beam
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HANS C. PFEIFFER & JOHN HARTLEY, US IBM, Hopewell Junction, NY, USA
ABSTRACT
Feature reduction and pattern shape count have outpaced Moore’s Law. Shaped-beam lithography offers the possibility of cost-effective mask-making. A new mask writer that has recently completed pre-integration testing is described. Performance specifications and projected throughput are given. The mask writer has a number of novel features.
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