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A New CVD Process For Damascene Low k Applications

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BEN PANG, WAI-FAN YAU, PETER LEE & MEHUL NAIK, Applied Materials Inc., Santa Clara, CA, USA

ABSTRACT

Alow dielectric material, “Black Diamond”, based on Silicon Dioxide has been developed. The density of the material and hence the dielectric constant can be modified by choosing an appropriate terminating molecular group. It has the added advantage that the properties of Silicon Dioxide are retained for the device manufacturing processes. It is produced by conventional CVD and so should be compatible with normal Fab line operations.
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