Online information source for semiconductor professionals

A New Approach for Scheduling Semiconductor Wafer Fabs

Popular articles

Voltaix names Peter Smith as CEO - 09 November 2011

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

JOHN W. FOWLER, W. MATTHEW CARLYLE, GEORGE C. RUNGER & ESMA S. GEL, Arizona State University, USA
SCOTT J. MASON, University of Arkansas, Fayetteville, AR, USA
OLIVER ROSE, University of Würzburg, Germany

ABSTRACT

According to the 1997 National Technology Roadmap for Semiconductors (NTRS), the cost of equipment is approaching 90% of wafer fab capital costs. The NTRS indicates that in order to utilise this equipment effectively, “significant improvements in factory planning/scheduling” are required. However, scheduling semiconductor-manufacturing facilities is a very difficult problem and is among the most complex scheduling problems encountered today. There are several main features that complicate scheduling these systems, including: a large number of processing steps, re-entrant flows, batch tools, planned and unplanned equipment downtimes, sequence-dependent tool setups, high levels of automation, and the fact that some processing steps require auxiliary resources (e.g. reticles).

Download Please login to download the paper. No account yet? Please register. It's free!

Related jobs

No related jobs found, sorry!

Related articles

The Advanced 200 mm Fab - 01 March 1999

New Product: Optimize 300mm fab tool scheduling every 5 minutes offered by ILOG’s Fab PowerOps - 19 October 2006

Resource Optimisation for 300mm - 01 June 2000

A New Low Cost Approach in 200 mm and 300 mm AMHS - 01 December 1999

30mm activity report: January to March 2007 - 01 June 2007

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: