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White Papers

Sub-Wavelength Lithography Using OPC

01 March 1999 | Edition 09, Lithography
FRANK M. SCHELLENBERG, Mentor Graphics, Inc., Wilsonville, OR, USA Read more >>

Simulation for DUV-Lithography

01 March 1999 | Edition 09, Lithography
WOLFGANG HENKE, Fraunhofer Institut Siliziumtechnologie, Itsehoe, Germany Read more >>

Metrology Issues in the Age of Next Generation Lithography

01 March 1999 | Edition 09, Lithography
S. A. RIZVI, Photronics Inc., Milpitas, CA, USA Read more >>

193 nm Microlithography and DUV Light Source Design

01 March 1999 | Edition 09, Lithography
BERND NIKOLAUS, OLIVIER SEMPREZ, GERRY BLUMENSTOCK, PALASH DAS, Cymer, Inc., San Diego, CA, USA Read more >>

Semiconductor Wastewater Treatment and Reuse

DR. STEVE ALLEN AND DR. MICHAEL R. HAHN, Microbar Incorporated, Sunnyvale, CA, USA Read more >>

Pushing the Envelope

CLIFF FIELDS, Newark, CA, USA
Read more >>

Investigation of Calcium Adsorption on Wafer Surfaces from Deionized Water

ASHUTOSH MISRA AND BUD L. SCHMIDT, Air Liquide Electronics Chemicals & Services, Inc., Dallas, TX, USA
LINDSEY HALL, JENNIFER SEES AND TRACE Q. HURD, Texas Instruments, Inc., Dallas, TX, USA Read more >>

Efficient Qualification of PFA Distribution Systems Using 0.49% HF and DI Water

ASHUTOSH MISRA, Air Liquide Electronics Chemicals & Services,Inc., Dallas, TX, USA
HERVE DULPHY AND ERIC DUCHATEAU, Air Liquide Electronics, Labielle, S.A., Pont De Claix, France Read more >>

Semiconductor Manufacturing in the 21st Century

01 March 1999 | Edition 09, Wafer Processing
R. SINGH, V. PARIHAR, K. F. POOLE, Clemson University, Clemson, SC, USA
K. RAJKANAN, KLA - Tencor Corporation, Miltipas, CA, USA Read more >>

New CoSi2 Silicidation Process for Sub-0.25 µm MOS Technologies

01 March 1999 | Edition 09, Wafer Processing
JAN WAUTERS, KAREN MAEX & ANNE LAUWERS, IMEC, Leuven, Belgium Read more >>