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Lithography efficiency: a cost comparison model

21 October 2010 |

By Sven Grünzig, Nemotek Technologie, Rabat, Morocco

ABSTRACT - This paper presents a calculation model and conclusions with focus on the comparison of low-throughput and high-throughput lithography clusters via an analysis of the lithography Cost of Ownership (COO) and applied data of the Overall Equipment Efficiency (OEE) and Overall Factory Efficiency (OFE).

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300mm activity report: Special Memory Focus

01 March 2008 | Edition 37
Mark Osborne, Editor-in-Chief, Semiconductor Fabtech Read more >>

300mm activity report: January to April 2008

01 March 2008 | Edition 37, 300mm Activity Reports | Comments (1)
Mark Osborne, Editor-in-Chief, Semiconductor Fabtech Read more >>

300mm Prime and the road to 450mm: Part 1

01 December 2007 | Edition 36, 300mm Activity Reports | Comments (1)
Mark Osborne, Editor-in-Cheif, Semiconductor Fabtech Read more >>

300mm Activity Report: October - December 2007

01 December 2007 | Edition 36, 300mm Activity Reports
Mark Osborne, Editor-in-Cheif, Semiconductor Fabtech Read more >>

The role of China and India in the future IC market

01 September 2007 | Edition 35 | Comments (3)
Bill McClean, IC Insights, Arizona, USA Read more >>

Interview: James Doran Spansion, Inc., EVP & COO

01 September 2007 | Edition 35
Mark Osborne, Editor-in-Cheif, Semiconductor Fabtech Read more >>

300mm activity report: June to September 2007

01 September 2007 | Edition 35, 300mm Activity Reports
Mark Osborne, Editor-in-Cheif, Semiconductor Fabtech Read more >>

30mm activity report: January to March 2007

01 June 2007 | Edition 33, 300mm Activity Reports
Mark Osborne, Editor-in-Cheif, Semiconductor Fabtech Read more >>

30mm activity report: March to June 2007

01 June 2007 | Edition 34, 300mm Activity Reports
Mark Osborne, Editor-in-Cheif, Semiconductor Fabtech Read more >>